Analysis of thin film formation on Particle-PLUS microtrench
It is possible to analyze the film formation process from both macro and micro scales.
The particle method plasma analysis software "Particle-PLUS," developed by Wavefront Inc., can analyze magnetron sputtering even in cases where there are micro trenches on the substrate. "Particle-PLUS" is capable of simulating the film deposition process by calculating both the macro scale of the entire sputtering device on a substrate that includes micro trenches and the micro scale concerning the micro trenches! *For more details, please download the PDF or feel free to contact us.
- Company：ウェーブフロント 本社
- Price：Other
